Pulsed laser deposition

  • ADVANCED PLD WITH IN SITU RHEEDTSST Advanced Pulsed Laser Deposition systems with in situ RHEED are state-of-the-art, highly flexible systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides. With the presence of high pressure RHEED in advanced PLD system configuration, single monolayer growth can be monitored and controlled at standard process pressures.
  • PLD FOR THIN FILM GROWTHTSST Pulsed Laser Deposition systems for thin film growth are state-of-the-art, highly flexible systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides. Customised design approach allows various types of heating, with which temperatures up to 1000°C are obtained. A base pressure below 10-7 mbar is guaranteed, with UHV upgrade possibilities. Pressure is regulated through automated upstream and downstream control, which combines fast pressure set-point control.

Atomic Layer Deposition

  • TFS 200 BENEQBeneq TFS 200 is the most flexible ALD research platform ever designed for academic research and corporate R&D. Beneq TFS 200 has specifically been designed to minimize any cross contamination that could happen in a multi-user research environment. The large number of available options and upgrades means that your Beneq TFS 200 will grow with you to meet even the most demanding research requirements.

Atomic Layer Deposition

  • GEMStar XT ALD SystemsThe Arradiance GEMStar XT product family delivers high quality performance in a compact Benchtop platform. Now with more configurable options to meet specific Customer requirements and budgets, we are confident that GEMStar can take your ALD research or low volume manufacturing to the next level.
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